Machines
Universal PVD Coating Centre SPUN 2
This high capacity PVD coating system allows a coat of up to 1200 kg in a single cycle. The table design allows for maximum flexibility in weight and shape of loaded parts, which is extremely important for coating service companies. . Doors and sub doors allow a cathodic arc to take any shape. Any shape of sputtering sources is capable, including a cylindrical rotatable sputtering source.
The plasma managing system of this PVD coating machine allows coating deposition in highly concentrated and ionized conditions. The result is the deposition of dense coatings with low internal stresses.
| Description | Parameters |
| Chamber volume | 2.3m³ |
| Chamber Dimensions | 1.6m L x 1.5m H x 1.7m D |
| Effective Coating Area | Diameter 1m x 0.8m |
| Number of Doors / Sub Doors | 2/4 |
| Coating Tables | 1 Rotating table with 6 planetary tilted sub tables with adjustable angles (0 - 25 degree) |
| Table Diameter | 1m |
| Maximum weight of the load per Table / Sub Table | 2,500/350 lb |
| Maximum part weight | 2,000 lb |
| Maximum part height | 0,8 m |
| Chamber / DoorMaterial | Stainless steel |
| Maximum vacuum level | 10-5 torr |
| Vacuum recovery time | 45 min form atmosphere to working vacuum degree |
| Heaters | Infrared heaters 30 KW evenly installed inside the chamber around each table |
| Process Temperature | 150-650°C |
| Shields | 2 sets |
| Gas Distribution System | 6 flow meters |
| Cooling system | SS water chanels |
| Vacuum system | Mechanical pump, Booster Pump, Turbo Pump (3,300 l/c) |
| Cathodic Arc Sources 180 mm diameter or circular, linear or cylindrical sputtering system replacing fully or partially cathodic arc sources | 8 |
| Rapid Plasma Heating System | 1 |
| Processes | Direct PVD, Ion Nitriding+PVD, PECVD, DLC, Hybrid Processes, Ion Stimulated Diffusion |
| Maximum power | 150 KVA |
